This device is a high-performance compact digital mass flow controller with advanced functions for equipments.
It features high speed and wide range flow rate control and 1%SP accuracy. With isolation of the power supply from the signal circuit, power supply noise can’t affect analog signals.
It realize the high noise tolerance.
Compact Digital Mass Flow Controller Model F4H provides fast and accurate control of gas mass flow rates while helping reduce the installation space required inside manufacturing equipment. Its digital communication capabilities enable efficient collection of flow data and device information, supporting easier system integration and operation. High noise immunity also helps maintain stable gas flow control in manufacturing equipment where multiple devices are installed.
PVD(Physical Vapor Deposition)
MFC supply argon gas to chamber to generate plasma.
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