This device is a high-performance compact digital mass flow controller with advanced functions for equipments.
It features high speed and wide range flow rate control and 1%SP accuracy. With isolation of the power supply from the signal circuit, power supply noise can’t affect analog signals.
It realize the high noise tolerance.
PVD(Physical Vapor Deposition)
Image
MFC supply argon gas to chamber to generate plasma.
Inquiries about control products