[Vacuum equipment(CVD,PVD,and etching) ] A full lineup of sensors that reliably detect liquid leaks Equipment Control products Case
Reduce man-hours by easy adjustment and output visualization -Machining Center- Equipment Control products Case
Better control of the enrichment gas flow rate stabilizes the carbon potential (CP), improving the quality of carburization. -[Combustion & resistance furnaces]Gas carburizing furnaces Equipment Control products Case
[Batch, single wafer cleaning equipment] A full lineup of sensors that reliably detect liquid levels Are you experiencing any issues with liquid level detection in batch or single wafer cleaning equipment for semiconductor manufacturing? Factory and plant Control products Case
Easy setup for reliable detection of slight (3–4 mm) stroke changes in collet chucks -CNC lathe- Equipment Control products Case
Improved control of gas flow rate stabilizes the flame and the brazing quality (Brazing) Equipment Control products Case
More uniform application of wafer cleaning chemicals Do you have the following issues? When the relationship of pressure and flow rate changes due to clogging, etc., the amount of chemical changes, affecting the quality of cleaning Equipment Control products Case
Proximity sensors with 2 ON/OFF outputs make expensive instrumentation smarter! -Machining Center- Equipment Control products Case
Detection of slight stroke changes (about 1 mm) in NC rotary tables and brake mechanisms, with easy setup -Machining center,NC rotary table(rotary & DD motor)- Equipment Control products Case
